TEAOH-based developer solution
Product Name
TEAOH-based developer solution
CAS Number
Molecular Formula
Molecular Weight
Product Appearance
Colorless and transparent liquid
Packaging Specifications
220 L drum, IBC
Core Uses
Photolithography development for LCD/OLED display panels, development of positive photoresist for semiconductors, silicon etching for MEMS devices, and alkaline cleaning of electronic components.
Product Features
Electronic-grade ultra-high purity, stable development rate, high selectivity, low surface tension, and good pattern fidelity.
Category:Formulated Products
Stripper
Product Name
Stripper
CAS Number
Molecular Formula
Molecular Weight
Product Appearance
Colorless to pale yellow transparent liquid
Packaging Specifications
220 L drum, IBC
Core Uses
Photoresist stripping, polymer residue cleaning after dry etching, residue removal after metal wiring etching, and photoresist removal in semiconductor/display panel manufacturing.
Product Features
Electronic-grade ultra-high purity, high stripping efficiency, low corrosivity to metals and dielectric materials, and no harmful residues.
Category:Formulated Products
Wafer cleaning agent
Product Name
Wafer cleaning agent
CAS Number
Molecular Formula
Molecular Weight
Product Appearance
Colorless and transparent liquid
Packaging Specifications
220 L drums, IBC
Core Uses
Removal of particles/metal ions/organic residues from semiconductor wafer surfaces; cleaning in various stages of chip manufacturing processes; MEMS device cleaning; photovoltaic wafer cleaning.
Product Features
Electronic-grade ultra-high purity, low surface tension, good wetting and spreading properties, and strong compatibility with substrate materials.
Category:Formulated Products
Hydroxylamine-based electronic-grade cleaning agent
Product Name
Hydroxylamine-based electronic-grade cleaning agent
CAS Number
Molecular Formula
Molecular Weight
Product Appearance
Colorless to pale yellow transparent liquid
Packaging Specifications
220 L drums, IBC
Core Uses
Post-etching cleaning IC process, contaminants removal from wafer surfaces, cleaning of photoresist residue, and cleaning agents for advanced packaging processes.
Product Features
Electronic-grade ultra-high purity, with low corrosivity to metals such as Al and Cu, high cleaning efficiency, and environmentally friendly with no harmful residues.
Category:Formulated Products